Our Pyrolytic Boron Nitride (PBN) is processed by Chemical Vapor Deposition (CVD). Performance PBN is the ideal choice for furnace, electrical, microwave, and semiconductor components.
Molecular beam epitaxy (MBE) is one of the most important epitaxial growth processes for group III-V and group II-VI semiconductor crystals in the world today.
The beam source crucible used in MBE needs to have the characteristics of high-temperature resistance, high purity, and long service life. The PBN Crucible can fully meet the above requirements. It is used as an ideal container for evaporating elements and compounds in the MBE process.
For more information on our Pyrolytic Boron Nitride material, contact us today.
Declaration: This is an original article of INNOVACERA®. Please indicate the source link when reprinting: https://www.innovacera.com/news/pbn-crucible-for-molecular-beam-epitaxy.html.
Enquiry